SINDRE

Cost efficiency and contamination control is obtained through hands-off operation and a sophisticated cassette-to-cassette handling procedure. The high throughput and yield enables an unsurpassed efficient cost of ownership. The standard configuration of the systems generates a throughput of 30 wafers per hour.

The SINDRE® 400 / 600 / 800 Nano Imprint Lithography (NIL) systems are designed for fully automated high volume production, using Obducat's proprietary IPS®/STU® process. 

The SINDRE® 60 Nano Imprint Lithography (NIL) system is designed for semi-automated production,  using Obducat's proprietary IPS®/STU® process. The system generates a throughput of 12 imprinted cycles per hour.