Others Electronics and AppliancesImprinter
Base material viscosity: 50mPa s Photo initiator designed for UV-curing Capability for step&repeat cycles > 1000 imprints demonstrated Exposure dose: 2J/cm² using quartz mold Applied by standard spin-coating process Usable with quartz, PDMS and PFPE molds Good adhesion to silicon substrates Average adhesion to SiO2, Ti, Au, PE Adhesion is vastly improved using AMOPRIME for substrate preparation Use of AMOPRIME allows imprinting on GaAs, GaN, InP, Al2O3
UV Nanoimprint is a mechanical molding technique. A template made from quartz or a flexible elastomer with a 3D relief is brought into intimate contact with a UV-curable resist spin-coated on top of a substrate. Applying low imprint pressure at room temperature features are filled within seconds due to the low viscosity of the imprint resist. The resist is hardened via UV-light through the backside of the template. Finally, substrate and template are separated. The replicated resist relief can further be transferred into the substrate via RIE-process or used as functional element.
Based on the extensive long lasting experience in the field of nanoimprint AMO developed an UV-curable resist (AMONIL®) and a matching adhesion promoter (AMOPRIME) which are commercially available.AMO GmbH has been engaged in research and development of UV-Nanoimprint Lithography within an array of projects for over 15 years. Based on this wealth of experience we were able to design AMONIL® and improve it on a regular basis. The resist combines outstanding coating and imprinting properties with excellent pattern fidelity and a reasonable plasma stability.