Portis

R&D, low and medium volume production Substrate sizes up to 600*1200 mm² / 1100*1300 mm² Substrate thickness: 0.5 – 10 mm Substrate carrier for foils and films Suitable for different substrate materials: glass, polymer, metal Easy exchange of flex stamp Compatible with various pre-treatment and coating machines Removable input and output stations Separate pre-treatment and coating machines Imprinting of markers for easy alignment in downstream equipment Flex stamp development Resist with special requirements Substrate carriers

This stand-alone roll-to-plate nanoimprint machine is ideal for Research and Development, process development and low to medium volume production of micro and nanostructures.

We understand the importance of R&D. Especially when you are still investigating the specifications of your final product.

The Portis is a stand-alone roll-to-plate nanoimprint module and is ideal for Research and Development, process development, low and medium volume production. It provides ultimate flexibility.

You can easily change flex stamps and adjust properties of the imprinting process, like speed, pressure, gap and UV settings.

After a manual feed-in of the substrate or product, the process is executed automatically and the patterned product can be picked up from the output station.

The Portis is compatible with various pre-treatment and coating machines, so you can design your perfect R&D and low volume production configuration.